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Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: 10⁻⁹ meter) generation[1] that support Extreme Ultra-Violet (EUV) lithog…
– 출처 : https://www.newswire.co.kr/newsRead.php?no=1002761&sourceType=rss [/auto_ads_show_after_click]
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